Top > Back > 学術論文・プロシーディングス・著作 の検索結果 140 件中 121‐140 件目
| A Novel Photoresist Based on Polymeric Acid Amplifiers |
| [ 全著者名 ] Sang-Wook Park, Koji Arimitsu, Sungeun Lee, Kunihiro Ichimura |
| [ 掲載誌名 ] CHEMISTRY LETTERS |
| [ 掲載年月 ] 2000年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Sensitivity Enhancement of a Photocuring Material by Base Amplifiers |
| [ 全著者名 ] Koji Arimitsu, Mana Miyamoto, Kunihiro Ichimura |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 2000年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Synthesis of 9-Fluorenylmethyl Carbamates as a Base Amplifier and Their Applications to Photopolymer Systems |
| [ 全著者名 ] Koji Arimitsu, Mana Miyamoto, Kunihiro Ichimura |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1999年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Acid Proliferation Processes of 3-Phenyl-3,3-ethyleneidoxypropyl Sulfonates in Photosensitive Polymer Films Leading to "Air-infection" |
| [ 全著者名 ] Kazuaki Kudo, Koji Arimitsu, Hironori Ohmori, Hiromitsu Ito, Kunihiro Ichimura |
| [ 掲載誌名 ] CHEMISTRY OF MATERIALS |
| [ 掲載年月 ] 1999年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Synthesis and Characteristics of a Novel Acid Amplifier with a Low Absorbance at 193 nm |
| [ 全著者名 ] Sang-Wook Park, Koji Arimitsu, Kunihiro Ichimura, Takeshi Ohfuji |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1999年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| 193 nm Lithography with Novel Highly Transparent Acid Amplifier for Chemically Amplified Resists |
| [ 全著者名 ] Takuya Naitou, Takeshi Ohfuji, Masayuki Endo, Hiroaki Morimoto, Koji Arimitsu, Kunihiro Ichimura |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1999年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Synthesis of Phenylsulfonylethyl Carbamates as a Base Amplifier and Their Applications to Photopolymer Systems |
| [ 全著者名 ] Mana Miyamoto, Koji Arimitsu, Kunihiro Ichimura |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1999年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| 3-Phenyl-3,3-ethylenedioxy-1-propyl Sulfonates as Acid Amplifiers to Enhance the Photosensitivity of Positive-working Photoresists |
| [ 全著者名 ] Kazuaki Kudo, Koji Arimitsu, Hironori Ohmori, Hiromitsu Ito, Kunihiro Ichimura |
| [ 掲載誌名 ] CHEMISTRY OF MATERIALS |
| [ 掲載年月 ] 1999年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Trioxane Derivative as an Acid Amplifier Exhibiting a Non-linear Organic Reaction |
| [ 全著者名 ] Koji Arimitsu, Kunihiro Ichimura |
| [ 掲載誌名 ] CHEMISTRY LETTERS |
| [ 掲載年月 ] 1998年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Synthesis of Trioxane Derivative as an Acid Amplifier and its Application for Photopolymer Systems |
| [ 全著者名 ] Koji Arimitsu, Kunihiro Ichimura |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1998年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Autocatalytic Fragmentation of Acetoacetate Derivatives as Acid Amplifiers to Proliferate Acid Molecules |
| [ 全著者名 ] Koji Arimitsu, Kazuaki Kudo, Kunihiro Ichimura |
| [ 掲載誌名 ] Journal of American Chemical Society |
| [ 掲載年月 ] 1998年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Visible-Light-Sensitive Photopolymer Systems Using Diol Monosulfonate as Acid Amplifiers |
| [ 全著者名 ] Akira Teranishi, Koji Arimitsu, Shin’ya Morino, Soh Noguchi, Kunihiro Ichimura, Hiromitsu Ito |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1998年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Novel Resist Materials Using Acid Amplifiers Part I |
| [ 全著者名 ] Koji Arimitsu, Soh Noguchi, Kunihiro Ichimura, Kazuaki Kudo, Takeshi Ohfuji, Masaru Sasago |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1997年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Novel Resist Materials Using Acid Amplifiers Part II |
| [ 全著者名 ] Soh Noguchi, Koji Arimitsu, Kunihiro Ichimura, Kazuaki Kudo |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1997年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Effect of Phenolic Hydroxyl Residues on the Improvement of Acid-Proliferation-Type Photoimaging Materials |
| [ 全著者名 ] Koji Arimitsu, Kazuaki Kudo, Yuko Hayashi, Kunihiro Ichimura |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1996年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Acid-Catalyzed Rearrangement for Monitoring the Migration of Acids in Polymer Films |
| [ 全著者名 ] Hiromori Ohmori, Koji Arimitsu, Kazuaki Kudo, Yuko Hayashi, Kunihiro Ichimura |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1996年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Autocatalytic Decomposition of a -Tosyloxyketone Acetal as an Acid Amplifier |
| [ 全著者名 ] Kazuaki Kudo, Koji Arimitsu, Kunihiro Ichimura |
| [ 掲載誌名 ] MOLECULAR CRYSTALS AND LIQUID CRYSTALS |
| [ 掲載年月 ] 1996年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Sensitivity Enhancement of Chemical-Amplification-Type Photoimaging Materials by Acetoacetic Acid Derivatives |
| [ 全著者名 ] Koji Arimitsu, Kazuaki Kudo, Hironori Ohmori, Kunihiro Ichimura |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1995年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| Enhancement of the Sensitivity of Chemical-Amplification-Type Photoimaging Materials by beta-Tosyloxyketone Acetals |
| [ 全著者名 ] Kazuaki Kudo, Koji Arimitsu, Hironori Ohmori, Kunihiro Ichimura |
| [ 掲載誌名 ] JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
| [ 掲載年月 ] 1995年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
| A Novel Concept of Acid Proliferation. Autocatalytic Fragmentation of an Acetoacetate Derivative as an Acid Amplifier |
| [ 全著者名 ] Kunihiro Ichimura, Koji Arimitsu, Kazuaki Kudo |
| [ 掲載誌名 ] Chemistry Letters |
| [ 掲載年月 ] 1995年 |
| [ 著作区分 ] レフェリー付学術論文（外国語） |
